The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 1994
Filed:
Feb. 26, 1991
Jun Fukuda, Shibuya-ku, Tokyo, JP;
Hideo Kawaguchi, Saitama, JP;
Takejiro Ushiroda, Saitama, JP;
Norio Shimizu, Sayama, JP;
Kazuo Sato, Tokyo, JP;
Hitachi, Ltd., Tokyo, JP;
Other;
Abstract
Apertures in a definite shape having a definite width and length are provided on one surface of a plate material having a definite thickness. One end of the apertures is connected with the other surface of the plate material and at the same time, is opened. Another end of the apertures is connected with the plate material on one surface and is also opened toward the other surface of a culture substrate. The plate material is closely contacted to one surface of the culture substrate for allocating nerve cells and observing growth of the neurites. Then, the cell suspension is supplied to the apertures. The cells in the suspension are allocated on the culture substrate in response to the apertures by centrifugation or spontaneous sedimentation. The plate material is then withdrawn.