The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 1994
Filed:
Mar. 29, 1993
Kiyoshi Takahashi, Ibaraki, JP;
Mikio Murai, Hirakata, JP;
Masaru Odagiri, Kawanishi, JP;
Hideyuki Ueda, Takatsuki, JP;
Yukikazu Ohchi, Kadoma, JP;
Tatsuya Hiwatashi, Kumamoto, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
A method of forming a film on a substrate by plasma CVD, comprising the steps of: providing a discharge tube in a vacuum chamber; providing a partition wall around the discharge tube; evacuating space between the discharge tube and the partition wall to vacuum; providing the substrate at a position confronting the discharge tube; and effecting plasma discharge in the discharge tube.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile