The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 1994
Filed:
Mar. 20, 1992
Teruhiko Hirabayashi, Tokyo, JP;
Yoshiyuki Imagire, Tokyo, JP;
Toshiaki Kurihara, Tokyo, JP;
Eiichi Akiyoshi, Tokyo, JP;
Ryoichi Maekawa, Tokyo, JP;
Nittetu Chemical Engineering, Ltd., Tokyo, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
A method of regenerating an etching waste fluid, includes the steps of dissolving HCl gas in an etching waste fluid at a temperature falling within a range of 20.degree. C. to 50.degree. C. and crystallizing NiCl.sub.2 and FeCl.sub.2 crystals, the etching waste fluid containing NiCl.sub.2, FeCl.sub.3, and FeCl.sub.2 and being obtained by etching Ni or an Ni alloy with an etching solution consisting of an aqueous solution containing FeCl.sub.3, distilling a mother liquor at the atmospheric pressure after crystallization and separation thereof to reduce the HCl concentration in the mother liquor, and distilling, at a reduced pressure, a concentrate obtained upon distillation at the atmospheric pressure to further reduce the HCl concentration, thereby obtaining an aqueous solution containing FeCl.sub.3, or bringing the concentrate obtained by distillation at the atmospheric pressure into contact with an iron oxide to cause HCl in the concentrate to react with the iron oxide to further reduce the HCl concentration in the concentrate thereby obtaining the aqueous solution containing FeCl.sub.3 with little HCl.