The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 1994
Filed:
Feb. 02, 1993
Stephen S Poon, Austin, TX (US);
Motorola Inc., Schaumburg, IL (US);
Abstract
A planar surface (24) is obtained in a semiconductor device (10) having regions of differing material composition by means of a non-selective planarization process. The non-selective planarization process removes insulating material and conductive material at substantially the same rate. In one embodiment of the invention, stud vias (22) are formed by the removal of portions of a conductive layer (20) overlying the surface of an interlevel dielectric layer (16). Once the conductive layer (20) has been removed, the planarization process is continued and surface portions of the interlevel dielectric layer (16) are also removed. Upon completion of the process a planar surface (24) is formed having regions of conductive material and insulating material.