The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 12, 1994

Filed:

May. 03, 1993
Applicant:
Inventors:

Yannick Chouan, Louannec, FR;

Michel Le Contellec, Lannion, FR;

Francois Morin, Lannion, FR;

Serge Saada, Lannion, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; C23C / ;
U.S. Cl.
CPC ...
1187 / ; 118719 ; 118715 ; 156345 ;
Abstract

The apparatus incorporates a h.f. source (2), a plasma enclosure ( 4 ) having gas supplies, a vacuum pump (50), elements for coupling the source to the plasma enclosure, which is of a non-radiating type and which is shaped like a rectangular parallelepiped with first and second dielectric material faces parallel to the direction of the magnetic field and a third face having a rectangular opening (14) parallel to said field for forming a ribbon-like plasma, a treatment enclosure containing a mobile sample holder (18) communicating via the opening with the plasma enclosure. The coupling means have two linear waveguides (30, 38 ) with a rectangular cross-section oriented in the wave propagation direction and located on either side of the plasma enclosure, a horn (36) for coupling one of the guides to the plasma enclosure, whose cross-section widens in the magnetic field direction, the other guide being provided with a short-circuit (46).


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