The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 1994
Filed:
Sep. 25, 1992
Tamio Hara, Tokyo, JP;
Manabu Hamagaki, Higashi-Matsuyama, JP;
Katsunobu Aoyagi, Tsurugashima, JP;
Takeshi Yamada, Kobe, JP;
Makoto Ryoji, Tokyo, JP;
Masakuni Tokai, Inami, JP;
Yosuke Kajiyama, Kobe, JP;
Kawasaki Jukogyo Kabushiki Kaisha, Hyogo, JP;
Riken Institute of Physical and Chemical Research, Saitama, JP;
Abstract
In an electron beam excited ion irradiation apparatus which irradiates ions to a material, an electrical discharge changes an inert gas into a plasma. Electrons are drawn from this plasma and are made into electron beams. The electron beams are passed through an active gas to create ion. When the ion is irradiated to a material, electron components of the electron beams, which are irradiated vertically to a surface of the material are changed their irradiation direction. Control of the range of electron beam irradiation is performed by a magnetic filed formed so as to surround the ion beams.