The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 1994
Filed:
Apr. 28, 1992
Tadao Toyama, Shizuoka, JP;
Atsushi Sakamoto, Shizuoka, JP;
Fuji Photo Film Co., Ltd., Minami-Ashigara, JP;
Abstract
A method for processing a photosensitive copying material comprises the steps of imagewise exposing to light a photosensitive copying material which comprises in order (i) a first photosensitive organic coating layer whose solubility in a developer varies through irradiation with light rays and (ii) a second organic coating layer containing a water-insoluble and organic solvent-soluble polymeric compound having an film-forming ability and then developing the imagewise exposed copying material, wherein the imagewise exposed material is dipped in the developer and then water-washed to remove the first and second organic coating layers on non-image portions. According to this method, the ability of the developer to process photosensitive copying materials is substantially improved, the amount of the waste liquor can substantially be reduced and a problem of environmental pollution can effectively be solved.