The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 1994
Filed:
Oct. 23, 1992
Applicant:
Inventors:
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430 23 ; 430 28 ; 156644 ;
Abstract
According to this invention, there is provided an improved method of manufacturing a shadow mask obtained by independently etching both the surfaces of a metal substrate. After one surface is etched to form a first opening, an etching resistive agent composition containing an acrylic resin, casein, and a leveling agent is applied to the obtained opening to form an etching resistive layer. Subsequently, the other surface is etched to form a second opening in the other surface, and then the etching resistive layer is removed to cause the first and second openings to communicate with each other.