The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 1994
Filed:
Aug. 21, 1992
Applicant:
Inventors:
Paul A Miller, Albuquerque, NM (US);
Mattan Kamon, Cambridge, MA (US);
Assignee:
Sematech, Inc., Austin, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
31511121 ; 31511131 ; 31511191 ; 31511171 ; 20419213 ;
Abstract
The present invention provides for a technique for taking advantage of the intrinsic electrical non-linearity of processing plasmas to add additional control variables that affect process performance. The technique provides for the adjustment of the electrical coupling circuitry, as well as the electrical excitation level, in response to measurements of the reactor voltage and current and to use that capability to modify the plasma characteristics to obtain the desired performance.