The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 1994
Filed:
Oct. 13, 1992
Applicant:
Inventors:
Jerry D Merryman, Dallas, TX (US);
S Charles Baber, Richardson, TX (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01D / ;
U.S. Cl.
CPC ...
250230 ; 25023116 ;
Abstract
A method and apparatus for precise control of a galvanometer patterning system is provided in which a patterning beam (12) is deflected off of a galvanometer mirror (14) toward a work piece (10). The position of the galvanometer mirror (14) is determined by generating a measurement beam (20), transmitting it through a cylinder lens (26) and deflecting it off of the galvanometer mirror (14). The deflected measurement beam (20) is filtered through grating filter (28) having two side-by-side gratings. Light passing through the side-by-side gratings filter (28) is focused on a detector (36) through an anamorphic condenser (32 and 34).