The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 1994
Filed:
Jan. 15, 1993
Applicant:
Inventors:
Assignee:
Sumitomo Chemical Co., Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
526 62 ; 526 74 ;
Abstract
Disclosed are a deposit suppressant composition for the internal surfaces of a polymerization reactor for polymerizing a vinyl monomer, comprising a naphthol sulfide compound having an average molecular weight of about 500 to 5000, as well as a method of polymerizing a vinyl monomer wherein prior to the polymerization, the deposit suppressant composition is applied to the internal surfaces of a polymerization reactor or added to the reaction system.
Sumino, Takeshi. (1994). Deposit suppressant composition for the internal surfaces of a (U.S. Patent No. 5321104). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5321104
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile