The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 1994
Filed:
Nov. 17, 1992
Frank A Ludwig, Rancho Palos Verdes, CA (US);
Bruce M Eliash, Los Angeles, CA (US);
Nguyet H Phan, Los Angeles, CA (US);
Vilambi N Reddy, Lakewood, CA (US);
Hughes Aircraft Company, Los Angeles, CA (US);
Abstract
A method of monitoring a plating bath which combines ac and dc voltammetry to accurately measure major and trace constituent concentrations. The method involves applying both ac and dc voltammetric signals to a pretreated electrode in contact with the plating bath solution, measuring the ac and dc response current spectra, and comparing the resultant spectra to determine which provides maximum spectral detail for monitoring particular constituents with minimum interference from other constituents. Then, the ac and dc response current spectra are each used to monitor the particular constituents for which each provides the best accuracy. The method complements and is easily integrated with known voltammetric techniques and equipment.