The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 1994

Filed:

Feb. 22, 1993
Applicant:
Inventors:

Kenji Saitoh, Yokohama, JP;

Masakazu Matsugu, Atsugi, JP;

Yukichi Niwa, Narashino, JP;

Noriyuki Nose, Machida, JP;

Minoru Yoshii, Tokyo, JP;

Shigeyuki Suda, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B / ; G01N / ;
U.S. Cl.
CPC ...
356375 ; 356401 ; 250548 ;
Abstract

A method of detecting relative positional deviation between first and second objects. The method includes the steps of providing the first object with a first mark which functions as a lens, providing the second object with a second mark which functions as a lens, providing an optical system between the first and second objects, directing a radiation beam through the first mark and the optical system to the second mark, and detecting any shift of the radiation beam from the second mark irradiated with the radiation beam from the optical system, to detect the relative positional deviation of the first and second objects.


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