The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 1994
Filed:
Dec. 31, 1992
Hui Wang, San Ramon, CA (US);
Other;
Abstract
A method and apparatus for producing x-ray and/or extreme ultraviolet (EUV) is described. A liquid edge 2 is electrically connected to a cathode 8 via a high voltage pulse power supply 10. Liquid edge 2 is set to be parallel to cathode 8. When high voltage pulse power supply 10 is turned on, a vacuum discharge will occur in a space between liquid edge 2 and cathode 8. The plasma will be confined into a high density and high temperature thin plasma column 4 in a space near liquid edge 2 by strong magnetic field induced by the huge discharge current. A population inversion in the confined plasma column will lead to a amplified simultaneous emission of x-ray and/or EUV 6 along the axis of plasma column 4. Moreover, a large power x-ray and/or EUV laser can be built by using multi-liquid edge-shape anodes placed in a straight line and operated in a traveling-wave mode.