The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 31, 1994

Filed:

Sep. 17, 1991
Applicant:
Inventor:

Aaron Shafir, Tel Aviv, IL;

Assignee:

Tamglass OY, Tampiere, FI;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ; B32B / ; B05C / ;
U.S. Cl.
CPC ...
430397 ; 427595 ; 118620 ; 118301 ; 118505 ; 1562755 ;
Abstract

A method and apparatus for exposing a substrate of relatively large surface area to radiation according to a predetermined pattern recorded on a mask, particularly useful in applying a painted border to an automobile windshield, includes the steps of progressively recording the predetermined pattern on a mask in the form of a continuous strip, and moving the radiation source to progressively scan the surface of the substrate with radiation, while at the same time moving the continuous strip mask relative to the radiation source, such that portions of the pattern on the continuous strip mask progressively become aligned with their corresponding portions of the substrate as the substrate is progressively scanned by the radiation source.


Find Patent Forward Citations

Shafir, Aaron. (1994). Method and system for applying a marking to a substrate, particularly a (U.S. Patent No. 5316897). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5316897

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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