The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 24, 1994

Filed:

Jan. 29, 1992
Applicant:
Inventors:

F Russell Huson, The Woodlands, TX (US);

Sergio Pissanetzky, The Woodlands, TX (US);

John D Larson, III, Palo Alto, CA (US);

Assignee:

Hewlett Packard Company, Palo Alto, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01F / ;
U.S. Cl.
CPC ...
335216 ; 335301 ; 324319 ;
Abstract

A C-shaped superconducting magnet for use in magnetic resonance imaging (MRI) equipment is disclosed. The magnet includes flux concentrators on opposing sides of the gap, for generating a vertical field therein; the flux concentrators include a plurality of coils, for carrying current in opposing directions, so as to generate an inwardly directed field to compensate for the gap. Injection correctors, each consisting of a horizontal coil, are disposed adjacent the flux concentrators. A flux return body, for example a superconducting solenoid or an iron yoke, provides a return path on the opposite side of the magnet from the gap. Flux deflectors guide return flux in a curved path from the flux return body to the injection correctors. The flux deflectors are constructed to include a superconducting coil which is wound about varying chords (or the full diameter) thereof, so that the induced flux is greater nearer the outside of the flux deflector, compensating for the tendency of the flux to crowd along the inner portion of the curved path. The return flux is thus provided to the injection correctors with sufficient uniformity to be corrected thereby.


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