The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 1994
Filed:
Sep. 10, 1992
Applicant:
Inventors:
Alfred Y Cho, Summit, NJ (US);
Sung-Nee G Chu, Murray Hill, NJ (US);
Kuochou Tai, North Plainfield, NJ (US);
Yeong-Her Wang, Scotch Plains, NJ (US);
Assignee:
AT&T Bell Laboratories, Murray Hill, NJ (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437105 ; 437107 ; 437126 ; 437133 ; 437129 ; 372 43 ; 372 44 ; 372 45 ; 372 46 ;
Abstract
Disclosed is a method for manufacturing a vertical cavity, surface-emitting laser. The method includes growing a distributed Bragg reflector having at least 10 layers of alternating composition on a gallium arsenide substrate. The growth surface of the substrate is tilted by an angle of 1.degree.-7.degree. from the orientation of a (100) surface toward the orientation of a (111)A surface. This results in improved reflectivity of the DBR.