The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 24, 1994

Filed:

Nov. 10, 1992
Applicant:
Inventors:

Matthew Simpson, Arlington, MA (US);

Robert M Frey, Worcester, MA (US);

Assignee:

Norton Company, Worcester, MA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C / ; B29C / ; C23C / ; C23C / ;
U.S. Cl.
CPC ...
264 81 ; 427553 ; 427577 ; 427249 ; 4272557 ; 264 39 ; 264219 ;
Abstract

A method for making a free-standing synthetic diamond film of desired thickness, including the following steps: providing a substrate; selecting a target thickness of diamond to be produced, the target thickness being in the range 200 microns to 1000 microns; finishing a surface of the substrate to a roughness, R.sub.A, that is a function of the target thickness, the roughness being determined from ##EQU1## where t is the target thickness; depositing an interlayer on the substrate, the interlayer having a thickness in the range 1 to 20 microns; depositing synthetic diamond on the interlayer, by chemical vapor deposition, to about the target thickness; and cooling the synthetic diamond to effect the release thereof.


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