The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 1994
Filed:
Oct. 08, 1993
Steven K Freeburne, Edgewood, KY (US);
Roland L Halm, Madison, IN (US);
Joseph P Kohane, Madison, IN (US);
Jonathan D Wineland, Fareham, GB;
Dow Corning Corporation, Midland, MI (US);
Abstract
The present invention is an improved process for the reaction of an alkyl halide with particulate silicon in a fluidized-bed process. The improvement comprises controlling the particle size of the silicon within a range of one micron to 85 microns. Preferred is when the particle size of the silicon has a mass distribution characterized by a 10th percentile of 2.1 to 6 microns, a 50th percentile of 10 to 25 microns, and a 90th percentile of 30 to 60 microns. Most preferred is when the particle size mass distribution of the silicon is characterized by a 10th percentile of 2.5 to 4.5 microns, a 50th percentile of 12 to 25 microns, and a 90th percentile of 35 to 45 microns. The process is run in the presence of a catalyst composition comprising copper and other catalysts.