The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 17, 1994

Filed:

Aug. 20, 1993
Applicant:
Inventors:

Rolf Mulhaupt, Freiburg, DE;

Joachim Rosch, Gundelfingen, DE;

Siegfried Hopperdietzel, Selb, DE;

Ekkehard Weinberg, Schonwald, DE;

Herbert Klein, Hof/Saale, DE;

Assignee:

Rehau AG+Co., Rehau, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08L / ; C08L / ;
U.S. Cl.
CPC ...
525432 ; 525436 ; 525183 ; 525184 ;
Abstract

A polymer mixture reinforced by an in situ, melt-polymerized microphase whereby the rigidity of the base material is increased, a process for manufacturing same, and use thereof for providing reinforced compositions and articles in which the polymer mixture is prepared by polymerizing a component B in a melt of a component A composed of at least one thermoplastic polymer. Component B is composed of at least one compound having the structure ##STR1## The reaction of component B in a melt of component A results in linear, branched or cross-linked, high or low molecular weight polymers constituting a microphase. Preferably, the microphases have the form of microfibers. In the structure of component B, X is NH.sub.2, NHR.sup.3, OH or an N-substituted, Y-activated lactam of the ##STR2## type which is activated with an electrophilic substituent Y, where Y is CO, SO.sub.2, or R.sup.5 P=O; R.sup.1, R.sup.2 and R.sup.4 are bivalent or multivalent aliphatic-, aromatic-, heterocyclic- or heteroatom-containing segments, with R.sup.2 and R.sup.4 preferably being bivalent aliphatic or aromatic radicals (CH.sub.2).sub.z in which 1<z<15; R.sup.3 and R.sup.5 are aliphatic, cycloaliphatic or aromatic radicals; and n and m are integers for which 1<m and n<5, and preferably m=n=1.


Find Patent Forward Citations

Loading…