The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 1994
Filed:
Jun. 05, 1992
Applicant:
Inventors:
Assignee:
Asahi Glass Company Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430313 ; 430314 ; 430317 ; 430323 ; 257642 ; 257759 ;
Abstract
A process for producing a semiconductor having a thin film of a fluorine resin as a protective film, which comprises coating on the surface of a fluorine resin a photoresist solution containing a surfactant, followed by exposure, development and etching for fine processing of the fluorine resin.
Unoki, Masao. (1994). Process for producing a semiconductor (U.S. Patent No. 5312716). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5312716
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile