The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 1994

Filed:

May. 20, 1992
Applicant:
Inventors:

Richard W Couch, Jr, Hanover, NH (US);

Nichols A Sanders, Norwich, VT (US);

Lifeng Luo, Lebanon, NH (US);

Zhipeng Lu, Lebanon, NH (US);

Patrik Backander, Lebanon, NH (US);

John Sobr, Enfield, NH (US);

Assignee:

Hypertherm, Inc., Hanover, NH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K / ;
U.S. Cl.
CPC ...
21912152 ; 21912149 ; 21912139 ; 219119 ; 219120 ;
Abstract

The diameter of a hafnium insert press fit into the bottom end of a copper electrode varies as a function of the level of current carried by the electrode. The diameter is the minimum necessary to support emission at that current level while also protecting the copper body against attack by the arc. The insert is generally circular and preferably extends completely through the bottom wall to a circulating flow of cooling water at a hollow interior of the electrode. The bottom wall includes an annular recess in a portion of the copper wall surrounding the insert. A coolant inlet tube extends into the recess in a spaced relationship to provide a high flow velocity of the coolant over the interior rear surface of the electrode.


Find Patent Forward Citations

Couch, Jr, Richard. (1994). Electrode for high current density plasma arc torch (U.S. Patent No. 5310988). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5310988

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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