The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 1994
Filed:
Dec. 18, 1991
Applicant:
Inventors:
Louis K Bigelow, Salt Lake City, UT (US);
Robert M Frey, Hudson, MA (US);
Gordon L Cann, Laguna Beach, CA (US);
Assignee:
Norton Company, Worcester, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B / ; C23C / ;
U.S. Cl.
CPC ...
428212 ; 51307 ; 51309 ; 428336 ; 428408 ;
Abstract
A multi-layer diamond film is grown by d.c. arc assisted plasma deposition. A series of layers are deposited on each other by periodically back-etching the surface and renucleating during deposition. There may also be deposited a thin layer of non-diamond carbon material between the diamond layers, but no other non-carbon material. Renucleation is controlled by varying the proportion of methane to hydrogen in the feed gases, by temperature cycling of the substrate, or by inducing modal changes in the arc.