The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 03, 1994

Filed:

Jan. 08, 1993
Applicant:
Inventors:

Jae K Kim, Toronto, CA;

Donald B Plewes, Toronto, CA;

Ross M Henkelman, Toronto, CA;

Assignee:

General Electric Company, Milwaukee, WI (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01R / ;
U.S. Cl.
CPC ...
324309 ;
Abstract

A method for MR imaging in an inhomogeneous magnetic field substantially without inhomogeneity induced artifacts is disclosed. The method includes acquiring more than one line of K-space per pulse sequence. The K-space data is acquired in partial line segments. The method allows shorter imaging times and higher image quality than conventional imaging methods for inhomogeneous fields.


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