The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 26, 1994

Filed:

Jul. 19, 1993
Applicant:
Inventors:

Kazuhiko Hashimoto, Moriguchi, JP;

Taichi Koizumi, Osaka, JP;

Kenji Kawakita, Neyagawa, JP;

Noboru Nomura, Kyoto, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430296 ; 430313 ; 430317 ; 430323 ; 430325 ; 430330 ; 430942 ; 2504921 ; 2504922 ; 2504923 ;
Abstract

Herein is provided a fine pattern forming method which is prevented from the charging-up phenomenon at the time of electric charged beam writing owing to the use of a polyalkylthiophene type conductive polymeric substance or a quaternary ammonium ion type polymeric substance in a monolayer or multilayer resist.


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Hashimoto, Kazuhiko. (1994). Fine pattern forming material and pattern forming method (U.S. Patent No. 5306601). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5306601

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