The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 1994
Filed:
Apr. 14, 1992
Mark R Kurz, Rochester, NY (US);
Steven J Weinstein, Fairport, NY (US);
Kenneth J Ruschak, Rochester, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A method for reducing the tendency toward the formation of ripple imperfections in the coating of a plurality of layers of liquid photographic compositions or moving webs is disclosed. Conditions for coating the compositions are determined according to a given formula to keep the ripple value below 35. The coating compositions are formed into a laminar flow of a plurality of distinct layers including the photographic compositions as upper, middle, and lower layers. The flowing plurality of layers is then received as a layered mass on a moving web. A method for predicting the tendency toward the formation of ripple imperfections in the coating of a multilayer photographic element is also disclosed.