The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 1994
Filed:
Jun. 16, 1993
Carbon Implants, Inc., Austin, TX (US);
Abstract
A 'closed-loop' moisture control system for use in vibratory mass finishing systems. A substantially constant amount of a grinding and/or polishing slurry is maintained in a finishing reservoir of the vibratory mass finishing system by controlling the amount of such fluid flowing from a supply reservoir into the finishing reservoir, and/or the amount of such fluid flowing from the finishing reservoir into a collection reservoir. In operation, a total weight of the supply reservoir and its contents, and of the collection reservoir and its contents is monitored and, in the event there is an increase in the total weight, a control means increases the amount of polishing fluid flowing from the supply reservoir into the finishing reservoir, and/or decreases the amount of polishing fluid flowing from the finishing reservoir into the collection reservoir. Conversely, in the event there is a decrease in the total weight, the control means decreases the amount of polishing fluid flowing from the supply reservoir into the finishing reservoir, and/or increases the amount of polishing fluid flowing from the finishing reservoir into the collection reservoir.