The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 1994
Filed:
Dec. 16, 1991
Hatsuo Nakamura, Yokohama, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
There is provided a pattern forming system of the present invention comprising a reticule on which a pattern is formed on one or more chips, an apparatus for preliminarily arranging a plurality of shot regions of a main surface of a wafer in a matrix manner in a case where regions where the pattern is formed by one shot are used as shot regions, an apparatus for calculating the number of the shot regions, which constitutes the matrix after sequentially moving the position of the shot regions to be a center of the matrix in a state that wafer is fixed, and the number of the chips wherein the pattern is completely formed on the main surface of the wafer, an apparatus for selecting a case in which the number of the shot regions constituting the matrix is the smallest and the number of the chips in which the pattern is completely formed on the main surface of the wafer is the largest, and an apparatus for forming the pattern, which is formed on the reticule, on each shot region constituting the matrix.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile