The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 1994
Filed:
Oct. 29, 1990
Applicant:
Inventors:
Mark A Harmer, Wilmington, DE (US);
Bruce A Parkinson, Hockessin, DE (US);
Assignee:
E. I. du Pont de Nemours and Company, Wilmington, DE (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
505410 ; 505701 ; 505702 ; 505728 ; 427 62 ; 427 63 ; 156643 ; 156655 ; 156656 ; 2504922 ;
Abstract
A process for etching with a scanning tunneling microscope on both a single crystal and a thin film of high temperature superconductor is disclosed.
Quick Actions:
Harmer, Mark. (1994). Etching of nanoscale structures on high temperature superconductors (U.S. Patent No. 5304535). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5304535
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile