The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 1994
Filed:
Jun. 15, 1992
Applicant:
Inventor:
Munehiro Chosa, Sodegaura, JP;
Assignee:
Idemitsu Petrochemical Company Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118728 ; 156612 ; 156613 ; 156614 ; 156D / ; 423446 ;
Abstract
In forming a diamond film on a surface of substrate by means of plasma method, there is employed in a plasma reacting chamber a supporting member having a top surface for placing the substrate so disposed as to be smaller than a bottom surface of the substrate and having engagement means for engaging with the substrate. When the substrate (particularly substrate for a cutting tool) placed on the top surface of the supporting member is brought into contact with plasma obtainable by exciting raw material gases, a diamond film is coated on the face, land and flank of the substrate for the cutting tool with a uniform film thickness.