The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 1994
Filed:
Nov. 25, 1992
Douglas O Hall, Canandaigua, NY (US);
Bruce R Muller, Rochester, NY (US);
David G Sherburne, Ontario, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
In an apparatus for processing photosensitive material, the apparatus having, a narrow processing chamber formed by a pair of substantially planar guide plates spaced apart a predetermined distance. The processing chamber having an entrance and an exit for allowing the photosensitive material to travel through the processing chamber. A first fluid supply is provided for supplying processing fluid to the processing chamber to create a first fluid layer on one side of the photosensitive material, and a second fluid supply is provided for supplying processing fluid to the processing chamber to create a second fluid layer on the opposite side of the photosensitive material. A plurality of spaced raised projection are disposed on the surface of the guide plates. The projections extend in a substantially perpendicular direction with respect to the direction of travel of the photosensitive material and across substantially the entire width of the photosensitive material.