The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 12, 1994

Filed:

Feb. 19, 1993
Applicant:
Inventors:

Christine J Landry, Honeoye Falls, NY (US);

Dennis J Massa, Pittsford, NY (US);

Timothy E Long, Hilton, NY (US);

Michael R Landry, Honeoye Falls, NY (US);

David M Teegarden, Rochester, NY (US);

Ralph H Colby, Rochester, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C08L / ; C08L / ; C08L / ; C08L / ;
U.S. Cl.
CPC ...
525 66 ; 525133 ; 525146 ; 525179 ; 525184 ; 525 92 ;
Abstract

Novel blends have been discovered comprising: (A) a polyamide; (B) a polymer that is miscible with polystrene; and (C) a compatibilizer comprising a copolymer having repeating units derived from an aromatic vinyl compound monomer and repeating units derived from vinylphenol monomers, wherein at least about 50% of said aromatic vinyl compound monomers are styrene monomeric units. The blends show improvements in mechanical properties as compared to similar blends without the compatibilizer.


Find Patent Forward Citations

Loading…