The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 1994
Filed:
May. 29, 1992
Shunpei Yamazaki, Tokyo, JP;
Naoki Hirose, Shimonoseki, JP;
Masaya Kadono, Atsugi, JP;
Kenji Itoh, Zama, JP;
Toru Takayama, Atsugi, JP;
Yasuyuki Arai, Atsugi, JP;
Noriya Ishida, Asahikawa, JP;
Semiconductor Energy Laboratory Co., Ltd., Kanagawa, JP;
Abstract
A microwave-assisted plasma processing apparatus has a reaction chamber in which a substrate holder is provided to support a substrate to be treated. The holder is formed congruent with the inside of reaction chamber and located to substantially separate a reaction space in the reaction chamber save for a narrow clearance therebetween through which exhausted gas passes from said reaction space into said auxiliary space. By this structure, high density plasmas can be formed in the reaction chamber without substantial loss of input microwave energy.