The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 1994
Filed:
Aug. 14, 1992
Applicant:
Inventor:
Hiroyuki Minami, Itami, JP;
Assignee:
Mitsubishi Denki Fabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 430311 ; 430323 ; 430324 ;
Abstract
A mask for use in an optical exposure apparatus with single wavelength light includes a light shielding film pattern having two spaced apart portions on a transparent substrate, a transparent thin film for shifting the phase of light transmitted through the mask disposed in the aperture between the light shielding film portions and spaced from the light shielding film portions. The resolution and contrast of the image of the pattern projected onto a wafer are enhanced and the resolution and depth of focus of the photoresist on which the pattern is projected are improved.