The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 1994
Filed:
Aug. 05, 1992
Applicant:
Inventor:
Charles Y Cha, Bethel Park, PA (US);
Assignee:
Calgon Corporation, Pittsburgh, PA (US);
Primary Examiner:
Int. Cl.
CPC ...
C02F / ;
U.S. Cl.
CPC ...
210700 ; 210701 ; 252180 ;
Abstract
Polyether polyamino methylene phosphonates, when used in combination with hydroxyphosphonoacetic acid (HPA) or amino tris methylene phosphonate (AMP), and added to various industrial water systems in concentrations between 0.1 mg/L and 50 mg/L, control silica/silicate deposition. In particular, this stabilization can be achieved under severe conditions which include elevated pH, high dissolved solids content, and high saturation levels of calcium carbonate.
Cha, Charles. (1994). Controlling silica/silicate deposition using phosphonate combinations (U.S. Patent No. 5300231). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5300231
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile