The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 1994
Filed:
Nov. 19, 1991
Masakazu Ichikawa, Tokyo, JP;
Yusuke Yajima, Kokubunji, JP;
Masatoshi Takeshita, Iruma, JP;
Toshio Kobayashi, Hinode, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A scanning interference electron microscope includes an electron source, a focusing lens, an electron beam deflection system and a biprism. The biprism separates the primary electron beam emanating from the electron source into two beams. One of the separated beams is controlled by the deflection system to scan the sample surface, thereafter interfering with the other separated beam to generated interference fringes. The phase difference due to interaction of the first electron beam with a sample surface produces changes in the interference intensity of the interference fringes, which represent a microscopic image of the sample.