The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 1994
Filed:
Jan. 29, 1993
Takeo Iwasaki, Nagoya, JP;
Hideo Maruyama, Kuwana, JP;
Kouji Inaishi, Okazaki, JP;
Chisato Yoshimura, Nagoya, JP;
Yuji Shinkai, Kounan, JP;
Brother Kogyo Kabushiki Kaisha, Nagoya, JP;
Abstract
The invention relates to an optical microlens array producing method. The microlens array producing method according to the invention uses an intermediate material forming process for forming an intermediate material of photoresist on a flat sheet, the intermediate material having projections formed in the shape of a predetermined pattern; a resist master forming process of forming a resist master by heating the intermediate material to thereby smooth the surfaces of the projections; an inverted mold forming process for forming an inverted mold having a surface shape that is the inverse of the resist master; a clad portion forming process, for forming a clad portion having grooves equal in sectional shape to the inverted mold, using the inverted mold and also using a first light-transmitting material of a low refractive index; a process for forming microlenses by filling the concave portion of the clad portion with a second light-transmitting material which is higher in refractive index than the first light-transmitting material microlens with index than the first or the second light-transmitting.