The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 1994
Filed:
Jan. 05, 1993
Applicant:
Inventors:
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
422-1 ; 106 1405 ; 106 1442 ; 106 1443 ; 422241 ; 427230 ; 526 62 ;
Abstract
This process is a method of preventing polymer scale formation in a polymerization vessel during the polymerization of a monomer having an ethylenically unsaturated double bond. The inner wall surface of a polymerization vessel is coated with a water-based coating solution containing (a) a water-soluble anionic dye and (b) at least water-insoluble cationic dye or water-insoluble nitrogen-containing organic compound, where the water-based coating solution has a pH of 7 or less. The coating solution is applied and then dried to form a coating.
Shimizu, Toshihide. (1994). Method of preventing polymer scale formation (U.S. Patent No. 5298220). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5298220
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