The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 1994
Filed:
Mar. 12, 1992
Philip A Lamarre, Waltham, MA (US);
Raytheon Company, Lexington, MA (US);
Abstract
A positive photoresist adhesion promoter which is provided as a thin layer between a resist such as polymethylmethacrylate for use on gallium arsenide is described. The positive photoresist adhesion promoter includes a mixture of a positive photoresist with an organic solvent. The use of the positive adhesion promoter increases the resistance of the resist such as PMMA to chemical stress during subsequent processing steps for the circuit. An alternative arrangement is to use a composition of the photoresist to be deposited as the masking layer as adhesion promoter layer and processing the adhesion promoter layer to induce cross linking in the resin component of the photoresist material to thus provide a tenacious bond between the adhesion promoter layer and the material of the substrate, such as gallium arsenide.