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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 5294520 B1

PDFFull Text
Date of Patent:
Mar. 15, 1994

Filed:

Aug. 25, 1992

Zero undercut etch process

Applicant:
Inventors:

Thomas A DeMercurio, Beacon, NY (US);

Richard J Hetherington, Pine Plains, NY (US);

Robert A Meyen, Salt Point, NY (US);

Scott A Sands, Hopewell Junction, NY (US);

Assignee:

International Business Machines Corporation, Armonk, NY (US);

Attorney:

Whitham & Marhoefer

Primary Examiner:

Marion E McCamish

Assistant Examiner:

Kathleen Duda

Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430314 ; 430313 ; 430318 ; 430394 ; 1566591 ; 1566611 ;
Abstract

A process in the fabrication of wiring patterns on ceramic or polymeric substrates precisely controls the cross-sectional dimensions of the metallization that constitute the wiring patterns. A single etch process defines thin film conductors on a substrate without loss to the conductor cross-section and provides enhanced thin film design flexibility. The zero undercut etch process uses photoresists defining the metal patterns to completely protect the metal patterns during the subetch.

Find Patent Forward Citations

DeMercurio, Thomas. (1994). Zero undercut etch process (U.S. Patent No. 5294520). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5294520

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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