The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 1994
Filed:
Feb. 11, 1993
Applicant:
Inventors:
Michael Geisler, Waechtersbach, DE;
Rudolf Koetter-Faulhaber, Hanau, DE;
Susanne Wuerz, Neuberg, DE;
Assignee:
Leybold Aktiengesellschaft, Hanau, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427489 ; 427250 ; 4272551 ; 4272556 ; 4272557 ; 427296 ; 427491 ; 427509 ; 427515 ; 427585 ;
Abstract
A process gas atmosphere consisting essentially of (a) organosiloxanes and inert gas, or (b) pure silane or (c) silane plus inert gas is introduced into a vacuum chamber and exposed to microwaves to produce an electro-cyclotron resonance in a plasma for coating substrates. The process is useful for producing an adherent coating on a plastic substrate, especially an intermediate coating for a reflective coating in an automotive headlamp.