The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 1994
Filed:
Jul. 14, 1992
Toshihisa Tomie, Tsukuba, JP;
Agency of Industrial Science and Technology, Tokyo, JP;
Abstract
A plasma generating apparatus for an extreme-ultraviolet laser that can generate high temperature plasma at high efficiency, and can form long plasma to be recombined by rapid cooling of the high temperature plasma. A shield plate including a narrow slit is disposed adjacent to a high temperature plasma source, and the high temperature plasma is discharged through the slit. Both high efficiency plasma generation and rapid expansion thereof can be simultaneously achieved by discharging high temperature plasma through the narrow slit. The rapid expansion makes it possible to form a long plasma having a large gain in an extreme-ultraviolet region. The high temperature plasma source can be readily realized by irradiating it with an exciting laser beam from behind the opposite side of the slit with regard to the high temperature plasma source directly or through a transmitting window. A closure provided in front of the slit can prevent a liquid or gas from flowing out of the slit before it is changed into plasma. This makes it possible to use a liquid or gas as a plasma source material.