The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 1994
Filed:
Jun. 29, 1992
Applicant:
Inventors:
Gerardus C Overbeek, Sprang-Capelle, NL;
Yvonne W Smak, Nieuwegein, NL;
Assignee:
ICI Resin BV, Waalwijk, US;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
435262 ; 210632 ; 528491 ;
Abstract
Method for removing radically-polymerisable unsaturated monomer from a dispersion of a polymer, made by non-enzymic polymerisation, by treating the polymer dispersion with a peroxide-generating enzyme (such as an oxidase) and an enzyme substrate(s), and usually oxygen, optionally with a reducing agent, under conditions to effect a reduction in the level of the residual monomer.
Overbeek, Gerardus. (1994). Removal of residual monomers from polymers using peroxide-generating (U.S. Patent No. 5292660). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5292660
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile