The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 1994
Filed:
Oct. 07, 1992
Applicant:
Inventor:
Mariste A Thomson, Santa Clara, CA (US);
Assignee:
Xinix, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430 30 ; 430311 ; 354298 ; 354317 ; 354325 ; 156626 ;
Abstract
A method for the control of photoresist develop processes employing multiple spray-puddle steps in which process changes other than time, such as endpoint are used to determine the length of the spray and puddle steps.
Quick Actions:
Thomson, Mariste. (1994). Method for control of photoresist develop processes (U.S. Patent No. 5292605). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5292605
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile