The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 1994
Filed:
Jul. 08, 1992
Takehide Kita, Sugito, JP;
Akihiko Kobayashi, Shiki, JP;
Susumu Takahashi, Matsudo, JP;
Toshiki Toda, Satte, JP;
Toppan Printing Co., Ltd., Tokyo, JP;
Abstract
An identification mark comprises a set of a plurality of mark elements. One mark element is divided into a large number of first and second fine square regions alternately arranged. One or two basic gratings selected from a plurality of types of basic gratings is/are drawn in both fine square regions, so that patterns are formed. Since the basic gratings are different in direction of the grating or spatial frequency, the types of the basic gratings are different from each other. One selected type of basic gratings is drawn in all first fine square regions. Similarly, the one or another type of basic gratings is drawn in all second fine square regions. At least one first fine region and at least one second fine region exist in the diameter of the light beam when light is radiated on the mark element for optical read. Thereby, types of patterns, which one mark element can obtain, are increased.