The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 1994
Filed:
Jan. 27, 1993
Tadashi Morokuma, Tokyo, JP;
Olympus Optical Co., Ltd., Tokyo, JP;
Abstract
A method for measuring eccentricity uses two radial gratings, in annular areas of which elementary patterns are provided at equal intervals so that the patterns of one radial grating are opposite to those of the other radial grating rotated by 180.degree.. Reference lines are provided on a rotary axis having eccentricity to be measured, coordinate axes relative to a bisector of the patterns opposite to each other are provided parallel with the reference lines, and spaces between the coordinate axes and the reference lines are measured, thereby allowing the shift of the rotary axis to be found. Thus, the eccentricity of the rotary axis can be measured with high accuracy.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile