The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 1994
Filed:
Jul. 16, 1991
Kintaro Aihara, Chiba, JP;
Tadashi Honda, Tokyo, JP;
Masashi Kobayashi, Kisarazu, JP;
Hideyo Rohyama, Tokyo, JP;
Kazuhiko Kurihara, Tokyo, JP;
Hiroshi Yazawa, Kunitachi, JP;
Toshikazu Ohishi, Kawaguchi, JP;
Nippon Petrochemicals Company, Ltd., Tokyo, JP;
Polymer Processing Research Inst. Ltd., Tokyo, JP;
Abstract
An improved method for producing a reticular nonwoven fabric in which the velocity of the transversely stretching line step can be much increased by providing the transversely stretching step with a longitudinally orienting step, thereby accelerating the whole production line. The method of the invention includes the continuous steps of: a first feeding step to feed a first film material; a longitudinally stretching step to stretch the first film material; a splitting step to split the longitudinally the stretched first film material; a laterally spreading step to spread the split film; a second feeding step to feed a second film material; a longitudinally orienting step to orient the second film material; a transversely slitting step to slit the oriented second film material; a transversely stretching step to stretch the slit second film material; and a laminating step to laminate the first film material with the second film material.