The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 1994
Filed:
Dec. 18, 1992
Applicant:
Inventors:
Nobutaka Magome, Kawasaki, JP;
Hiromitsu Iwata, Yokohama, JP;
Junichi Morino, Yokohama, JP;
Toru Kiuchi, Kurume, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B / ;
U.S. Cl.
CPC ...
355 53 ; 355 50 ;
Abstract
This specification discloses a method of and an apparatus for manufacturing a disc medium which utilize the projection exposure technique of a stopper for lithography, rotate a circular photosensitive substrate which provides the disc medium at the same speed as a circular reticle having a pattern of information tracks while rotating the reticle, and irradiate the reticle with illuminating light of a slit-like shape or a sectoral shape extending in the diametrical direction of the circular reticle to thereby effect rotation scan exposure.