The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 1994
Filed:
Feb. 08, 1993
Noriaki Nakamura, Nara, JP;
Hiroyuki Shimoyama, Nara, JP;
Kinichi Isaka, Yamatokoriyama, JP;
Akio Inohara, Osaka, JP;
Hiroshi Kishishita, Nara, JP;
Sharp Kabushiki Kaisha, Osaka, JP;
Abstract
There is provided a vapor deposition method for depositing a deposition material of an evaporation source on a substrate while a temperature of the substrate is uniformly kept. The method is implemented in a vapor deposition apparatus in which the evaporation source comprising the deposition material is opposed to the substrate in a vacuum chamber, a heater for heating the substrate is provided across the substrate from the evaporation source in the vacuum chamber and an equalizing plate is provided between the substrate and the heater. In addition, the equalizing plate is larger in size than the substrate and its thermal conductivity is 200 W.multidot.m.sup.-1 .multidot.K.sup.-1 or more and an infrared energy emissivity is 0.2 or more.