The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 1994
Filed:
Nov. 23, 1992
Applicant:
Inventors:
Takeshi Sumino, Niihama, JP;
Tetsuyoshi Yano, Niihama, JP;
Assignee:
Sumitomo Chemical Company, Limited, Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
526 62 ; 526204 ; 526234 ; 526344 ;
Abstract
Disclosed is a method of polymerizing a vinyl monomer wherein prior to the polymerization, a deposit suppressant composition comprising an 8-hydroxyquinoline sulfide compound is applied to the internal surfaces of a polymerization reactor.
Sumino, Takeshi. (1994). Method of polymerizing vinyl monomers with use of a deposit suppressant (U.S. Patent No. 5284925). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5284925
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile